The methods of plasma generation and extraction used and patented by HS-Group GmbH enable the use of plasma technology in a wide range of applications.
Switching our plasma sources to different frequencies such as 13.56 MHz, 27.12 MHz, or 40 MHz is easily possible. Higher frequencies lead to a higher degree of ionization and thus to a higher plasma density, a higher ion current, and higher energy.
Coatings directly "from the source" are possible. For example, in DLC processes, we prepare the C+ atoms in the source and treat the surfaces with defined energy, current, and direction.
The magnetic field coils are axially oriented. This allows the influence of the magnetic field and changes in the beam characteristics (energy, focus). With the magnetic field, the plasma can be adjusted to various process conditions such as chamber pressure.
Further special features of our QUATRON plasma sources:
- Neutral and parallel beam (no static charging of the substrate)
- Extraction grid - the only wear part
- Ion energy in the beam exactly adjustable: 20 ... ~2000 eV
- Beam current strength: up to ~6 mA/cm²
- Typical operating/pressure range: 1*10^-4 ... 5*10^-3 mbar
- Very monochromatic energy distribution in the respective pressure range
- Plasma operation with multiple gases simultaneously with first contact (mixing) in the plasma source
With our capacitively coupled plasma sources, both CVD processes and plasma-assisted processes in common PVD methods are possible. The energy range typically extends from 20 eV up to 2000 eV and higher.
